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4-Acetoxystyrene
4-Acetoxystyrene
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4-Acetoxystyrene monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component of photoresist which currently is the main body of the 248nm photoresist resin. 248nm photoresist is mainly used in the field of microelectronic chips and liquid crystal displays,with the wave length of 248nmKrf laser for processing medium,widely used in the large-scale industrialization lithography production.

         Through continuous research and innovation,our company develop a set of industrial production process of the products .It will be a positive role in promoting the 248nm photoresist localization.

      Product Name:4-Acetoxystyrene

      Cas No:2628-16-2

      Molecular Formula: C10H10O2

      Molecular Weight:162.19

      Appearance:colorless transparent liquid,no floating debris

      Melting Point:7-8℃(lit.)

      Boiling point:260℃(lit.)

      Density:1.06 g/ml at 25℃(lit.)

      Refractive index:n20/D1.538(lit)

      Flash Point: 190 °F  

The Main test items

Test content

Company standard

Remarks

Content

>99%

GC

Water

<0.2%

KF

Polymer

<0.5%

GPC

Metal Ion

<50ppb

 

Inhibitor

20-50ppm

MEHQ


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